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EUV firms to partner to speed up source improvements
Ushio Inc. (To
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kyo, Japan) has said that it has signed a letter of intent to form a partnership with Koninklijke Philips Electronics NV and Jenoptik Laser Optik Systeme GmbH to co-develop extreme ultra violet light sources for lithography. The objectives of the partnership are to speed up the development of EUV lithography and make it practical as the post-ArF laser immersion technology, said Ushio. Details... more...
3U VPX backplane features twisted - ring topology
Elma Bustronic expands its VPX backplane product line with a 3U version. The company now offers VPX backplanes in 3U, 6U, and 6U Hybrid sizes. Details... more...
Isolators target 6 kV electrical isolation
O
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PTEK Technology offers an extended range of isolators -- the OPI7320 and OPI7340 devices -- for 6 kV electrical isolation in contaminated environments. Details... more...