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EUV firms to partner to speed up source improvements
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EUV firms to partner to speed up source improvements |
Ushio Inc. (To
5b4
kyo, Japan) has said that it has signed a letter of intent to form a partnership with Koninklijke Philips Electronics NV and Jenoptik Laser Optik Systeme GmbH to co-develop extreme ultra violet light sources for lithography. The objectives of the partnership are to speed up the development of EUV lithography and make it practical as the post-ArF laser immersion technology, said Ushio.
Details
2007-11-02 12:27:00
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