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High - k process for CMOS cancels gate leakage
A high-k dielectric process for CMOS transistors promises to turn the International Semiconductor Roadmap into a freeway by eliminating the gate-leakage problem at advanced nodes down to 10nm. Details... more...
IBM, ATMI collaborate on implanted photoresists
A joint development agreement to demonstrate advanced chemical formulations for highly implanted photoresist strip applications has been forged between ATMI, Inc. and IBM Corp. Details... more...
Apple, AT&T face lawsuit over iPhone voice mail tech
A patent infringement lawsuit has been filed by Klausner Technologies against Apple and AT&T over the voice mail technology used by the iPhone. Details... more...