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Groups collaborate on EUV lithography advances
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Groups collaborate on EUV lithography advances |
Belgian research gro
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up IMEC (Leuven) and another leading center for next-generation nanoelectronics research and development, the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in Albany, New York, will collaborate on extreme ultraviolet lithography experiments as a means to accelerate the introduction of EUVL into manufacturing. Details
2008-01-21 16:11:00
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