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NIST aims at 32 nm

The National Institute of Standards and Technology, in a program funded by the SEmiconductor MAnufacturing TECHnology consortium (SEMATECH), has invented a neutron beam measurement technique for imaging the edge of photoresist lines made by masks during photolithography and found that new formulations are needed for the 32-nanometer node.
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2007-12-17 20:34:00

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