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Interview: Intel research trio discuss 45 - nm high - k

Three Intel res 5b4 earchers Robert Chau, Kaizad Mistry and Tahir Ghani, who were part of the team behind the 45nm high-k metal gate success, talk about the highs and lows of the project and what motivated them to press on and move on to more challenging endeavors.
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2007-11-22 12:33:00

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