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Toppan, CEA-Leti explore double patterning
Toppan, CEA-Leti explore double patterning
Toppan Photomasks Inc. a 5b4 nd CEA-Leti have signed a joint development agreement to explore double patterning techniques for extending 193-nm lithography to next-generation semiconductors.
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2007-09-19 01:43:00
 
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